Equipment
Description: SPS supported custom design Features: Provides O 2 , N 2 , Ar, Cl 2 , SiCl 4 , H 2 , N 2 O, CF 4 , CHF 3 , SF 6 , NH 3 , SiH 4 /Ar, SiH 2 Cl 2 Purita Ultrapure Water Supply © LS MNE / TU Dortmund [...] Reactive Ion Etching (RIE) Features: Chlorine chamber: SF 6 , Cl 2 , CHF 4 , SiCl 4 , N2; Fluorine chamber: SF 6 , O 2 , Ar, CHF 3 , N 2 Oxford PlasmaLab 80Plus © LS MNE / TU Dortmund Description: Reactive [...] dry), H2 and N2 tempering Nabertherm RSH 80/500/13 Description: Low Pressure Chemical Vapour Deposition (LPCVD), Diffusion and oxidation furnace Features: LPCVD, Oxidation (wet and dry), H2 and N2 tempering …
